What is Cold Plasma?

Cold Plasma

What is Cold Plasma?

 "Purifying Plasma"

By utilizing the principles of photochemistry, cold fusion plasma, and photoionization, contaminants, both organic and biological can be removed from the air and surfaces.

 

While these methodologies have been well studied and documented by the scientific community, the synergy of their interaction produces a unique and a superlative way of providing a true "real time" technological system for ensuring superior indoor air quality.

To ensure that these affects are distributed throughout the facility being addressed, we utilize the HVAC system which act as the "heart and lungs" of a building.

Photochemistry is the chemical reaction or change in material caused by exposure to light energy.

The process typically requires the use of photons in the ultraviolet spectral range.

Ultraviolet radiation serves to excite or cleave chemical bonds and leads to the desired photoinduced reaction

Energetic ultraviolet radiation is useful for disinfection proposes. For this application, the fundamental physical requirement for the ultraviolet light source is sufficiently high photo energy (wavelength) at the required intensity.

When sufficient photo energy is present, ultraviolet light becomes particularly useful in the destruction of contaminating organic compounds.

Almost all indoor contaminants are organic.

Organic compounds are carbon based. Many common organic compounds are based on the carbon and hydrogen combination, or hydrocarbons.

Hydrocarbons can be toxic volatile organic compounds such as formaldehydes and benezenes.

Airborne, indoor dust particles like dander, hair, dust mites feces, etc. Are based upon organic compounds generally associated with the lipid group. Biological contaminants Re bacteria, viruses, and fungi are carbon based

Photochemistry can break down these harmful organic molecules. Ultraviolet light with enough energy such as in the 100-280 manometer wavelength can break down the electron bonds of an organic molecule. The shorter the wavelength the more energy created to break molecular bonds.

All organic material is photodegradable at certain wavelengths.

LJV wavelengths in the 100-280 manometer bandwidth not only break down electron bonding of an organic molecule, but also initiate the formation of a cold gas plasma.

 

A plasma is an excitation of gas by radio frequency energy. In our case, we excite gases by the energy from ultraviolet light waves. We create a highly energized gaseous state.

 

The plasma, or highly energized gaseous state, is aggressive and highly reactive and contains excited atoms and molecules, ionized gases, radicals, and free electrons.

It can destroy just about all organic contaminants.

The destruction mechanism primarily involves the photodissociation of molecular oxygen leading tot he formation if highly oxidizing species, such as atomic oxygen, molecular singlet oxygen and activated oxygen. These agents interact with contaminants converting most to volatilized carbon dioxide and water. The LJV radiation also creates electron ejection of organic molecules that produces additional free radical creation.

The radicals react with oxygen producing hydroperoxide ions. The hydroperoxide process activates a chain reaction with organic compounds triggering further oxidation. When additional hydrogen is added as in the form of water vapor ( humidity), the highly oxidative species hydroxyl radicals is created

These radical ions are stable but a very potent o-ne-clectron oxidant.

They are very destructive to organic contaminants because they steal hydrogen atoms from the organic materials, leaving decaying carbon ions.

The theft of hydrogen from organic molecules forms even stronger hydroxyl radical bonds with even higher oxidation potential.

This entire process turns into a chain reaction - the breakdown and formation of new hydroxyl radicals results in the continual decay of organic material.

While the photoelectric effect created by high energy ultraviolet light is ejecting electrons forma molecule, it is further enhanced by irradiating what is called a "photoelectron emitting membee'with ultraviolet light.

A photoelectron emitting member may be made of any material that emits photoelectrons upon exposure to ultraviolet radiation.

Such a photoelectron emitting member is contained in our technology.

The photoelectrons ejected from the photoelectron emitting member are used to charge fine particles in a gas which are then removed form the air stream as they attach to oppositely clwged surfaces.

This electrically charging dust and other particulates can remove particles as small as .00 I micron. It should be noted that each of the electron ejections can cause multiple ionization events. For example, in the photoelectric effect, the photon undergoes only one interaction, yet thousands of ionizations can be caused by the resultant electron and its products.

The combination of ultraviolet light and plasma has been reported to be an extremely potent in removing contaminants from surfaces.

As an example and for comparative purposes, it has been estimated that removing biological contaminants from surfaces by corona discharge created ozone may take IO hours.

 

Ultraviolet light in the highly bacterial range of 253.7 manometers would take I hour for the same result. Corona discharge ozone and ultraviolet light combined would achieve the same result in 1.5 minutes. However, the use of a broader and more energetic ultraviolet bandwidth combined with the resulting plasma would clean the same surface in 20 seconds

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